Used BREWER SCIENCE CEE 100CB #9165200 for sale

BREWER SCIENCE CEE 100CB is a photoresist equipment designed for use in the fabrication of advanced microelectronics and semiconductor devices. The system employs a unique combination of photo-initiated polymerization and enabling technologies to achieve superior patterning fidelity, high resolution, and efficient utilization of photomask exposure energy. This product consists of a photoactive epoxy-based material that is spin-applied to a wafer substrate and then exposed to a customized mask. This mask contains the design pattern of the desired design in the form of transparent windows and opaque walls. Upon exposure, the epoxy material polymerizes precisely along the edges of the mask pattern, forming hardened microscale structures that faithfully replicate the shape and size of the mask openings and walls. The polymerized material then serves as a physical mask for subsequent etching processes, resulting in the desired device pattern. BREWER SCIENCE CEE 100 CB material exhibits excellent resolution, pattern control, and scan resistance, and is suitable for intricate patterning of sub-50 micrometer devices. Additionally, CEE 100CB's energy efficiency allows for economical polymerization of large-scale patterns, allowing for improved throughput and yield. Through utilization of a high performance photo-initiator package to optimize photo intermediate concentration, CEE 100 CB improves wafer process depth and uniformity. BREWER SCIENCE CEE 100CB photoresist unit is a cost-effective solution for device manufacturers looking for high-resolution and reliable patterning performance. Its combination of performance and energy efficiency enable faster, more reliable production of devices with complex patterns and microscopic features. BREWER SCIENCE CEE 100 CB machine is ideal for manufacturers who require accurate and efficient pattern generation in order to meet the demands of advanced device fabrication.