Used BREWER SCIENCE CEE 100CB #9237990 for sale

BREWER SCIENCE CEE 100CB is a comprehensive photoresist equipment specifically designed for lithography processes. It is uniquely engineered according to bubble technology, meaning it is highly capable of producing advanced leading-edge nannetic devices and advanced 3D LP Structures. It has a photoresist chemistries that has reacted uniformly with a uniform polymer matrix and offers robust performance and stability. Moreover, it provides an integrated post exposure bake process and is ready to use. This system makes use of a liquid developer that helps maintain a uniform development, which removes excess photoresist material, thus enabling accurate film thickness control. This photoresist unit is designed with an advanced contrast control that helps produce higher quality film with superior resolution. This machine also has high solubility to permit imaging with wide exposure latitude. Furthermore, it allows for a high resolution capability up to 90nm. This tool is also designed with a low exposure energy requirement, permitting low throughput and improved yield. Another feature of BREWER SCIENCE CEE 100 CB is the improved surface planarity that is produced by the overall performance of the surfactant suppressants. This feature is beneficial in that it is capable of producing improvements in device yield. Moreover, this asset is also compatible with multiple dielectrics and supports multiple dry etching processes. Its polymer matrix is designed to ensure that the designs and images do not degrade when exposed to extreme environments, thus resulting in optimal film performance. The other distinctive feature of this model is its spin speed variability that ensures the highest uniformity of the photoresist. It is also designed with anti-reflection coatings that reduce reflections and signal loss. It is also capable of supporting both single and double patterning processes. Additionally, it has good registration accuracy that ensures reliable pattern transfer over large wafers. Furthermore, it is formulated to be resistant to metal contamination from aluminum and copper interconnect lines, thus offering improved long-term reliability of the chips. In conclusion, CEE 100CB photoresist equipment is an advanced and comprehensive system that is designed to achieve optimum results in application such as nanofabrication and microelectronics. It is equipped with many useful features, such as uniform development and high resolution capability, that are helpful in producing high quality film with superior resolution. Moreover, its polymer matrix and anti-reflection coatings provide improved long-term reliability and enhanced performance in harsh environments.