Used BREWER SCIENCE CEE 200 #293751586 for sale

BREWER SCIENCE CEE 200 is a state-of-the-art photoresist equipment that offers unparalleled flexibility, accuracy and control during the lithographic process. Designed with powerful but simple integrated automation, this photoresist system makes it easy to achieve controlled and balanced exposure times, tolerances and geometries. The unit is outfitted with an adjustable adaptive control, allowing the user to adjust the Photoresist exposure time easily, enabling pinpoint accuracy. The automated binary logic machine allows users to register film with great precision and accuracy. Its high-resolution scanner uses its advanced imaging features for great detail registration and contrast, utilizing a variable laser pulse width, laser spot size and energy to match the film characteristics. The tool is also equipped with a unique film gripping mechanism which ensures that the film is planted firmly for all exposure cycles. CEE 200 also features a wide range of image capturing and mastering capabilities that provide configurability to the asset. Its integrations with the Cutter Read Module (CRM), Controller Module (CM) and the Variable Scan module (VSM) allow the user to easily configure the model's mask-making systems. Furthermore, the automatic exposure support equipment makes gap measurements on the wafer's surface to ensure proper focus and exposure time across the whole wafer. BREWER SCIENCE CEE 200 system offers a comprehensive development and production workstation with all the necessary functions and controls to produce quality photoresists. Its opto-mechanical integration provides maximum flexibility and control in development, allowing users to customize the unit's functionality to fit the application. All CEE 200 systems are powered by the intuitive Brewmaster III software, allowing the user to select and customize all process elements with ease. All in all, BREWER SCIENCE CEE 200 machine is an incredibly powerful and reliable photoresist release tool that offers unparalleled accuracy, control and flexibility for lithography processes. Its automated features, dynamic integrations and powerful imaging capabilities make it the perfect choice for today's demanding manufacturing processes.