Used BREWER SCIENCE CEE 200 #293765607 for sale

BREWER SCIENCE CEE 200 is an industry standard, non-deposition photoresist equipment used for semiconductor wafer fabrication. The system is comprised of two parts; the Photoresist Processor and the Wet Station. The Photoresist Processor consists of a double-walled cylindrical chamber, with an inner surface of quartz glass, which is used for diffusion heating. The UV exposure unit is located in the center, and is capable of exposing features with widths of down to 4 microns. The Photoresist Processor is adjustable, allowing mask stepper programs to be optimised for a specific photoresist. The Wet Station is used for develop and rinse cycles. It can be configured with a variety of modules for specific applications. It works by using liquid and spin-coating techniques to formulate and apply the photoresist. The Wet Station is also equipped with a vacuum module that enables improved resist adhesion and enhanced uniformity. The transport machine of the Wet Station allows for wafer transfer, including conveyance between modules. CEE 200 tool offers a variety of applications. It is well-suited for IC fabrication, thin-film deposition, circuit debug, planarization, and lithography processes. The asset is fully automated and can be configured with a variety of features to meet specific wafer fabrication needs. It is highly sensitive to light wavelengths and offers excellent alignment during exposure. BREWER SCIENCE CEE 200 also offers precision control of exposure times, with a resolution of 0.1 µm. Furthermore, CEE 200 offers high-precision operation and cleanroom compatibility, making it is a reliable tool for the development of new semiconductor technology. It is also designed for extended service life, with advanced features enabling maintenance and floor serviceability. The model has also proven to be reliable in a variety of ramp-up applications, including 16nm and 10nm lithography. Overall, BREWER SCIENCE CEE 200 equipment is an advanced photoresist processor that offers excellent performance for a wide variety of semiconductor fabrication tasks. It offers highly precise features with a long service life, making it an indispensable tool for emerging semiconductor technology.