Used BREWER SCIENCE CEE 200 #9265629 for sale

BREWER SCIENCE CEE 200 Photoresist Equipment is a tool used by advanced technology companies and research institutes to create incredibly detailed circuitry and structures with a lithography process. The lithography process involves protecting certain areas of a workpiece from a strong etchant to create an etching-resistant material. The photoresist system uses a light source to "draw" onto the workpiece using a mask template that enables precision in the illumination of the area with resist material. CEE 200 Photoresist Unit consists of a steel photoresist gun, two stainless steel rollers, and two spool separators, which enable the user to feed and precisely control the amount of material required. It also includes tools for manual resist application, as well as accessories for spray coating and foam application. Additional accessories like spin coaters, edge beads, and a conveyor arm enable even more precise and precise control over the application of the resist. The photoresist materials for BREWER SCIENCE CEE 200 Photoresist Machine come in two different thicknesses, 75 and 500 nanometers. The resist materials will react to light in different ways depending on the thickness chosen to give different grades of etching resistance and line resolution. The materials are classified as Type CEE-A, for low light intensity applications, and Type CEE-B, which is particularly suitable for high-resolution design and require effective shielding from light. CEE 200 Photoresist Tool has a range of features that enable it to facilitate lithography processes of various kinds in microelectronics. As well as its ability to apply resists quickly and accurately, it also has a high temperature range of operating environment (up to a maximum of 200°C). The asset also has in-line computer controls that allow users to make quick adjustments to the process to ensure accuracy and to prevent defects. It also has a range of degassing options to eliminate air pockets from the resist material and a built-in monitor that can indicate any defects or errors in the resist application. Since its introduction in the late 1990s, BREWER SCIENCE CEE 200 Photoresist Model has been widely adopted in the production of various types of electronic components including integrated chips, transistors, diodes, and LEDs. The equipment is capable of producing incredibly fine lines and features with a resolution of 0.5µm (micrometers) and it has become essential for the production of modern microelectronics. CEE 200 Photoresist System offers an effective and reliable way to create precise and detailed structures that are essential for the creation of high-performance electronics.