Used BREWER SCIENCE CEE 2100 #77373 for sale

BREWER SCIENCE CEE 2100 is a photoresist equipment used in semiconductor manufacturing to etch, or "develop", features in microelectronic devices and other products. Photoresist systems are used to create a negative image on the surface of a substrate in order to etch, or remove, material to create a desired shape or pattern. CEE 2100 is an advanced photoresist system designed for the production of high-value microelectronic devices and micro-structured components. BREWER SCIENCE CEE 2100 photoresist unit features a vacuum cha&mbsp;mber, substrate holder and wafer handling machine for rapid, efficient loading and unloading of substrates. CEE 2100 tool also includes a unique and efficient dual-stage imaging assembly, which provides the optimal photoresist coverage to the substrate surface. The Photoresist Stripper is a specialized tool that is used to remove excess photoresist material from the substrate surface and the Substrate Cleaner is used to clean the substrate surface prior to coating the photoresist. The photoresist process begins with the pre-process or pre-clean cycle where surfactants, solvents, and detergents are used in order to prepare the substrate for coating. The pre-process cycle is followed by a coating cycle, which is used to apply a uniform and accurate layer of photoresist material to the substrate. The photoresist is then exposed to electromagnetic radiation that is used to activate the photoresist and imprint the desired pattern onto the substrate surface. Post-exposure treatments are then employed to further refine the image. The photoresist is hardened and developed, which allows the photoresist to remain on the substrate surface while excluding the desired pattern. After development the parts are rinsed in a wet chemical bath, which dissolves the photoresist off of the remaining areas of the substrate surface and leaves the desired pattern. The final steps of the photoresist process include post-exposure substrate cleaning and rinse, which help to remove any residual photoresist material from the substrate surface. BREWER SCIENCE CEE 2100 asset is designed for advanced microelectronics and micro-structured components and offers a reliable, efficient and accurate process for photoresist processing.