Used BREWER SCIENCE CEE 4000 #9378937 for sale

BREWER SCIENCE CEE 4000 is a state-of-the-art photoresist equipment designed for advanced lithography purposes. It features a full array of photoresist technology and a highly reliable rugged design for use in cleanroom conditions. BREWER SCIENCE 4000 is capable of exposing the photoresist from a range of angles and a variety of lithography masks such as OPC and infinity exposure masks. This makes it suitable for a variety of applications such as semiconductor device manufacturing and microfabrication. CEE 4000 features a highly reliable vacuum-based photoresist coating and baking cycle. This vacuum enables a low-temperature baking of the photoresist materials for maximum photo-mechanical stability and yield. The uniform vacuum enables control of the lithography process and a higher resolution imaging. Its wide range of automated process capabilities ensure maximum uptime and cost savings. It includes automated liquid and dry film formation, exposure, processing, and post processing cycles. This increases both production efficiency and uniformity. 4000 also incorporates an immersive connectivity system allowing it to be integrated into a digital manufacturing workflow. This enables increased collaboration across departments, teams, and systems. It also allows users to connect with remote systems, allowing for remote control and monitoring of the entire process. The unit is certified for cleanroom use and features a pre-aligned nozzle machine for optimal particle detection. It also features an in-line liquid filtration tool to ensure a clean processing environment and minimize particle and contamination issues. In conclusion, BREWER SCIENCE CEE 4000 is a state-of-the-art photoresist asset designed for advanced lithography. It features advanced automation capabilities, a highly reliable vacuum-based photoresist coating and baking cycle, and an immersive connectivity model for greater collaboration and remote control. This equipment is a reliable and cost-efficient photoresist system suitable for a variety of lithography applications.