Used BUHLER / LEYBOLD OPTICS UCS 40 #9363015 for sale

BUHLER / LEYBOLD OPTICS UCS 40 is a photoresist equipment intended for use in the semiconductor industry. This system uses photolithography techniques to create patterns on a substrate, with a high-resolution SEMI Standard BSIM3v3 model for accuracy. The unit is equipped with an advanced exposure unit, ultra-high-precision electro-mechanical stages, and Xenon Lamp Lightsources. In the exposure stage of operation, the upper substrate is exposed to a pattern replicated on the mask. The mask is illuminated by a laser, which is modulated to the appropriate intensity and focused onto the substrate. The exposure unit ensures that the maximum intensity of the laser is reached, and that the exposure is uniform throughout the substrate. After exposure, the image is transferred from the mask to a silica-based resist, which is distributed on the substrate before entering the development stage. The development stage is designed to increase or reduce specific areas of exposed resist according to the mask pattern. This is done by means of swabber wafers that help maintain a homogeneous balance of resist in the areas that need to be exposed or developed. The precision of the development is further increased by the use of electro-mechanical stages, allowing for accurate operation at a micron level. The final stage of the photoresist process is the photoresist removal stage. This stage utilizes an acid-based solution to dissolve any exposed or developed resist. Ambient temperature is carefully monitored to maintain an optimal reaction speed, allowing for the highest quality results. BUHLER UCS 40 is a reliable photolithography machine, tested by industry professionals to deliver the most accurate and high-quality results. The tool is available from a variety of suppliers, and its design and features make it readily adaptable for any semiconductor production process.