Used C&D SEMI 2-T:I\8838\8844\88SMC\8836\I #9177167 for sale

C&D SEMI 2-T:I\8838\8844\88SMC\8836\I "photoresist" equipment is an automated coating application system used in the production of high-precision electronic components. It utilizes a variety of distinctive technologies and features in order to ensure uniform, high-quality coatings across multiple layers and over a wide range of surfaces. The unit uses an advanced ion beam assisted deposition (IBAD) technique to create a uniform, consistent coating. Utilizing a heavy ion beam that is targeted to specular ends of components in the process chamber, the machine creates a grid of mesh of atoms which provides a platform for uniform coating processes with finer control than other methods. The IBAD technique also creates a stronger bond between the coating and the substrate - which is essential in ensuring the success of the product during manufacturing. The tool also utilizes a spin-voting rinsing process, which is designed to ensure that the coating is evenly distributed across the board. The spin-voting process is ideally suited for use with photoresist due to its precise control of the speed of deposition, which allows for the most consistent and uniform coating possible. C&D SEMI asset also features a multiple-source particle simulation chamber that is used to create highly accurate wafer-level reproductions of a design. The particle simulation chamber uses an advanced particle tracking model to accurately simulate a wide variety of patterns, shapes, and angles. This allows the production of highly precise components with better repeat accuracy and greater product uniformity. In addition, the equipment integrates the use of automated coating and post production processes such as sputter etching, post exposure bake, and desmear. The automated system consists of an acid bath, solvent chamber, and thermal reflow chamber that can be used to quickly and accurately finish components. These processes provide for improved repeatability and uniformity, and reduce the amount of time required for product development. C&D SEMI 2-T:I\8838\8844\88SMC\8836\I unit is designed to provide the highest possible levels of accuracy and uniformity when applying photoresist coatings. With its advanced IBAD technology, spin-voting rinsing process, and automated post-production processes, this photoresist machine is an essential part of any organization's production process.