Used C&D SEMI 2-TRK:8626/36/36/I #9177294 for sale

C&D SEMI 2-TRK:8626/36/36/I is a adaptable photoresist equipment that is designed for precision materials processing applications that require accurate and repeatable results. The system is designed for use with a variety of photoresist materials across multiple processing steps, including thin-film deposition, photolithography, etching, and ion implantation. The unit consists of two tracks, one for photolithography and the other for etching and ion implantation, each of which can be configured to accommodate a wide range of substrates and materials. The photolithography track is compatible with both standard positive and negative photoresists, and various pre-exposed and post-exposed resist techniques, enabling the user to achieve pin-point accuracy in the imaging of structures with feature sizes as small as 6.5 microns. The etch/ion implant track is capable of processing materials with sub-micron precision, with the ability to precisely control etching rate and directional ion implantation. The machine can be configured with additional components and accessories, such as an in-situ pressure chamber for enhanced etching performance, as well as a plasma generator for further control of etching parameters. Combining advanced photolithography and etching technologies, C&D SEMI 2-TRK:8626/36/36/I provides a reliable and repeatable process for deep-submicron materials processing. Its application range extends from semiconductor device fabrication to precision optical systems.