Used C&D SEMI 2-TRK:I/8626/36/36/I #9133837 for sale

C&D SEMI 2-TRK:I/8626/36/36/I is an industrial grade photoresist processing equipment specifically designed for demanding semiconductor production environments. The system's design provides reliable, uniform processing of up to 8,626 wafers per run and 36 inch wafer sizes. C&D SEMI 2-TRK:I/8626/36/36/I unit is comprised of two (2) independent processing chambers each with its own individual control panel, vacuum machine, and photolithographic production capabilities. The primary feature of the photoresist tool is its ability to generate uniform and repeatable photoresist results for all wafers processed. This is accomplished through two independent photolithographic exposure systems that can generate the identical pattern on two adjacent or non-adjacent wafers. Each chamber can be individually optimized for processing photoresist, minimizing downtime and cost. In addition, the chamber features automated process optimization through software that allows for repeatable production of wafers with minimal down time. This automated process optimization further reduces cost and time spent on production runs, as well as increasing the wafer yield. C&D SEMI 2-TRK:I/8626/36/36/I asset features a temperature range of up to 300°C and a vacuum model capable of up to 10-7 torr. The equipment is equipped with a programmable shutter system to provide controlled mask exposure. This feature allows for single wafer exposure or batch exposure of multiple wafers in the same run, further reducing processing time. The unit also utilizes class 100 clean bench technology, which includes an on-board particle monitoring machine. This allows for optimal control of particle levels, as well as monitoring of contamination, to ensure a clean working environment. C&D SEMI 2-TRK:I/8626/36/36/I photoresist tool offers a comprehensive set of features to provide industry-leading photolithographic production for semiconductor production environments. The asset offers a wide range of temperatures, pressures, and precise control of photolithic exposure times. The software-based process optimization allows for repeatable production processes with minimal downtime and cost. The model's clean bench technology further ensures that the environment remains free of contaminants. With this powerful and reliable photolithographic production equipment, manufacturers can reduce cost and time to produce high quality wafer yields.