Used C&D SEMI 6700 #9219324 for sale

C&D SEMI 6700 is a photoresist equipment designed to help manufacturers etch specialized patterns onto a variety of substrates. The system is widely used in the electronics industry to etch protective layers and coatings onto various components. The core components of 6700 are two integrated optical systems. The first unit uses an advanced lithographic microscope to help users create highly precise, intricate patterns on the substrate. This microscope is equipped with sophisticated optics, allowing users to accurately target and identify even the smallest features. The second optical machine utilizes a high-power lithographic exposure tool to transfer user-defined patterns onto the substrate's surface. This asset couples backside illumination with an imaging model that likely uses a series of lenses to provide a high-resolution image of the substrate. This equipment can also use an IR camera to detect any small irregularities in the substrate, helping reduce the chance of errors. The process begins with a photoresist solution applied to the substrate's surface. This resist material is sensitive to light and will later be used to protect the patterned surface from etching chemicals. When the device is loaded with the substrate, the resist material is selectively exposed to the focused light pattern generated by the microscope's optics. C&D SEMI 6700 is highly configurable, offering numerous model variations to suit different requirements. The device features an intuitive user interface, allowing users to quickly set pre-defined parameters and begin etching patterns onto the substrate. Additionally, the device is equipped with various safety features to minimize the potential of operator error. In conclusion, 6700 is a versatile, high-performance photoresist system. The combination of advanced lithographic optics and an embedded backside illumination imaging unit give it the capability to produce highly detailed and accurate patterns on substrates. Furthermore, the robust user interface allows users to quickly set parameters and begin etching processes while the safety features provide an additional layer of protection.