Used C&D SEMI 86 Track #9153416 for sale

C&D SEMI 86 Track is a positive tone photoresist equipment designed for chrome blue lithography. This system is a highly reliable three-stage negative photoresist unit, providing users with uniformity and high resolution capabilities. The first stage of 86 Track is Spin Coating and it involves the spin coating of the photoresist over the substrate. This is usually done with a spin coater machine that has a range of RPM speed settings, allowing for thick and uniform layers. The higher the speed, the thicker the layer. The second stage is Exposure and it is where shortwave ultra violet light is used to expose the photoresist. This light passes through the photomask, allowing for parts of the photoresist to receive either positive or negative exposure in accordance with the coding of the photomask. The third stage of C&D SEMI 86 Track is Develop and it is responsible for the removal of either the exposed or non-exposed photoresist. This stage uses a chemical agent which reacts to the photoresist and removes the unnecessary parts. After development, the photoresist layer remains only on the desired parts of the substrate - forming a highly detailed lithography layer. The advantage of using 86 Track is that it is a highly reliable and consistent tool when compared to others. The developer does not need to be adjusted throughout the process and the final layer produced is of high quality. Furthermore, with its three-stage process, C&D SEMI 86 Track allows for high resolution of parts, allowing users to produce exact parts without blurring or smudging. 86 Track is an ideal choice for those looking for a reliable and consistent photoresist asset that provides superior lithography capabilities.