Used C&D SEMI P-8000 #9153359 for sale

The CD SEMI C&D SEMI P-8000 Photoresist Equipment is a high-performance photolithography system for fabricating advanced structures on semiconductor substrates. The unit is capable of depositing and removing highly accurate, thin layers of photoresist onto silicon wafers, providing excellent etch selectivity and compatibility with a wide range of substrates. It is designed for optimum accuracy and throughput, with the ability to process up to 53 wafers per hour, with a patterning accuracy of +/- 1.5μm. The machine consists of a vacuum chamber, a conventional stepper optics tool, a quartz bowl, a substrate holder, and a substrate stage. The photolithography optics asset includes a beam splitter and condenser lens that are designed to provide even illumination of the substrate. The quartz bowl is used to house and hold the photoresist prior to its deposition onto the substrate. The substrate holder is equipped with a heater, which is used to control the temperature of the substrate during the photoresist deposition. The substrate stage, which is driven by a high-resolution stepper motor, allows precise placement of the substrate during the photolithography process. C&D SEMI P8000 is equipped with a Single-Mode Annular Diode Laser (SMADL) that is used to accurately control the wavelengths of light used to expose the photoresist. The SMADL laser is specifically designed to ensure the highest accuracy and quality of the photolithographic patterning. Furthermore, the solid-state design of P 8000 results in high reliability, allowing it to withstand the rigors of tough industrial environments. The model is equipped with a variety of features that can help to improve performance and reduce production costs. For example, the equipment is equipped with an automatic film cutting tool which allows for the precise selection of film length and position, thus optimizing substrate utilization. Furthermore, the system utilizes an advanced photo-resist processing temperature control unit, which helps to ensure consistent patterning performance. Finally, P8000 is compatible with a wide range of substrates, including gallium arsenide, silicon carbide, and diamond. In summary, the CD SEMI C&D SEMI P 8000 Photoresist Machine is a robust and efficient photolithography tool for fabricating advanced micron-scale structures. It provides excellent accuracy and throughput, with compatibility for a wide range of substrates, and is equipped with advanced features to help reduce production costs and improve performance.