Used C&D SEMI SVG 86xx #9132896 for sale

C&D SEMI SVG 86xx is an advanced photo-resist equipment designed to fabricate photomasks for semiconductor manufacturing. It is a fully-integrated automated system, which enables customers to manufacture high-precision photomasks quickly with repeatable and reliable results. The unit is capable of patterning and resolving features down to 0.15μm, enabling customers to create intricate cases with accurate features. Additionally, its advanced photo-resist machine enables it to platform a variety of pattern shapes and create patterns with high precision. It also makes use of various advanced features such as variable pattern shape sizes, linear tapers, chamfers, and photoresist chipping for corner trimming. SVG 86xx boasts a wide range of capabilities, such as LED-based light sources, multi-wavelength imaging, and PMS particle beam lithography. It also offers support for shutter tool, high aspect ratio resist development, and backside exposures. What's more, it features the PATRA auto-focus asset, which provides repeatable and precise autofocus capability. Moreover, C&D SEMI SVG 86xx also features a range of advanced imaging options for pattern registration and photo-mask fabrication. These options include linear array processing, matrix array processing, simultaneous imaging, and fine-tuning of photoresist development. Furthermore, its integrated pattern projection model can be readily configured configured to suite a range of applications. SVG 86xx equipment provides a highly customizable platform that is suitable for a wide range of application requirements. From PCB design to integrated circuits, this advanced photomask fabrication system is suitable for a variety of applications, such as thin film resist processing, power electronics, biochips, and automotive electronics.