Used CALITECH CT-605D #293586437 for sale

CALITECH CT-605D is a photoresist equipment designed for patterning applications within the semiconductor and microelectronic industries. A photoresist is a photo-sensitive polymer used to create patterns on a substrate such as silicon wafers. CT-605D features a robust design capable of quick and accurate implementation of photo masking processes. This high-performance system utilizes a triple wavelength deep ultraviolet (DUV) light source, enabling users to match a variety of DUV types without having to employ additional materials or equipment. CALITECH CT-605D is designed to process substrates up to 12" in size with exceptional performance and accuracy. It can be used to make advanced patterns on both standard and customized substrates, as well as develop advanced photoresist layers with superior adhesion, elasticity and thermal stability. The unit offers a wide range of optical components to meet different patterning processes. It also offers compatibility with a variety of photoresist resists, allowing users to maximize productivity while preserving detail and quality. Additionally, this machine is compatible with standard and digital image editing tools, so users can easily create complex patterning designs with high precision. CT-605D features variable-speed scanning, advanced control tool and programmable edge support, allowing users to control each step of their patterning process with precision. The asset also features a comprehensive safety model, maximizing operator safety during operation. In addition to providing superior performance, CALITECH photoresist equipment is designed for easy maintenance and robust operation, minimizing downtime and user training. The platform is designed for use in a wide range of industries and applications, making it an ideal choice for patterning applications within the semiconductor and microelectronic industries.