Used CALITECH CT-608D #293760256 for sale

CALITECH CT-608D is a state-of-the-art photoresist equipment that delivers highly accurate and reliable resist patterning on a range of substrates, such as silicon, metal alloys, and advanced materials. The system is specifically designed with the latest, most advanced photoresist slicing, imaging, and development technology to reduce particle contamination and improve the resolution and accuracy of lithography. CT-608D uses a ultraviolet (UV) laser source in an 8-inch wafer cassette that is mounted on a motorized wafer handling station. The laser is used to cut photoresist patterns precisely onto a substrate, layer by layer, while a computer-controlled unit ensures the accuracy of the patterning process. In addition, CALITECH CT-608D features a unique up-front alignment machine that minimizes errors before the pattern is etched onto the substrate. The laser source is also capable of delivering a range of wavelengths, from ultraviolet to infrared, to support the needs of different materials. The tool can also detect and compensate for any non-uniformities in the substrate to ensure that the resist lines are accurately drawn and imaged. The asset is equipped with a closed-loop recipe-controlled imaging model that allows users to precisely control exposure times, laser power settings, and other imaging parameters. This provides users with the flexibility to match the lithography process to their specific requirements and substrate type. The equipment features a high-resolution camera and compact optics, both of which are designed to improve the resolution and repeatability of imaging processes. Also, the 5-axis replicator is designed to provide extra resolution for fine details, and to reduce non-sharpness artifacts. The camera also features an integrated, automated inspection system that can detect any pattern errors or debris. CT-608D also has a patcher driver unit that is designed to reduce the dispersion of patterns that can cause wire-bond misalignments. Additionally, the machine includes a built-in resist development tool so that users can easily load and clean wafers without the need of an external asset. This development model includes an auto-desmear capability to remove residual resist from the surface of the substrate, which helps to improve nanofabrication. CALITECH CT-608D is a powerful, reliable, and highly accurate photoresist equipment, that is able to consistently deliver the highest quality photoresist patterns for a range of materials, and provides users with an automated and precise imaging process for their most demanding lithography processes.