Used CANON CDS-630 #9269121 for sale

CANON CDS-630 is an advanced photoresist equipment designed for industrial use. It combines the latest off-the-shelf imaging technology and master-fabrication knowledge to provide advanced capability in imaging and preparing resist substrates for use in industrial applications. The system is capable of processing a wide range of substrate types, including acrylics, polyimides, polyesters, epoxies, and more. CDS-630 utilizes a digital imaging unit for producing the desired photoresist patterns or images. This is comprised of a high-resolution linear variable dispersive spectrometer combined with an optical polarizing microscope for producing both visible and ultraviolet images of the substrate in order to be accurately patterned. The imaging machine is capable of producing various image sizes, from inches down to microns, depending on the substrate and application requirements. For the deposition of the photoresist, CANON CDS-630 employs a sol-gel solution that is dispensed into a well-mixed container, from which it is injected into a vertical spooling chamber via a fine nozzle. This ensures uniformity of the deposition on the substrate and uniformity of pattern uniformity. Following this, the substrate is heated to a preset temperature and a vacuum is applied in order to remove any excess resist liquid that may be present and to create an air-cleaning process. Once the photoresist has been cured, post-bake operations are available to further enhance the image. These include irradiation, flood exposure, and electroplating. Following this, etchback and photo-assist processes are available that allow for further cleaning and preparation of the substrate. A variety of laboratory instruments, such as spin coaters, acid etchers, and molds, are also available for manual processing. Overall, CDS-630 photoresist tool is a reliable and capable imaging and processing solution for industrial applications. Its advanced imaging and patterning capabilities make it the ideal choice for producing complex patterns with high resolution and uniformity. Additionally, its wide range of post-bake operations provide a great level of flexibility and customization, allowing for a wide range of substrate types to be properly prepared for specific applications.