Used CANON CDS-650 #9111287 for sale

CANON CDS-650 is a photoresist equipment used for forming thin film patterns on semiconductors. The system features a superior optical unit that is capable of producing high-resolution patterns with submicron precision. The machine utilizes a novel solution to photolithography that is based on a unique combination of long- and short-wave UV lamps. CDS-650 has a maximum substrate size of 300mmx300mm. The tool uses a CeASTAR-300 litho mask aligner with through-the-lens imaging and a 1024 x 1024 pixel CCD camera with a 10-bit dynamic range to enable high-precision alignment of photomasks. CANON CDS-650 has coaxial LED-driven positioning heads that offer sub-micron precision for accurate alignment. CDS-650 employs advanced CANON LEXT OLS 4000 laser scanning confocal microscopic technology to provide excellent resolution and pattern fidelity. The asset can achieve minimum feature sizes of 0.25 microns, meaning it is suitable for microelectronic applications. The model's photoresist solution is based on reagents that contain the highly reactive photoactive compounds (PACs) necessary for high-resolution imaging. These PACs are adsorbed onto the surface of the substrate, allowing for rapidly and uniformly irradiation of the photoresist. CANON CDS-650 utilizes this unique process to form thin film patterns with impressive resolution. The equipment also has several features designed to enhance user safety. An automatic wafer loading system allows for easy, safe handling of wafers. A safety interlock unit prevents ultraviolet (UV) exposure outside the photoresists processing area. Additionally, the machine features a safety monitor to alert operators when the UV exposure levels are outside the acceptable range. To ensure consistently high-quality results, CDS-650 utilizes a programmable shutter to deny UV exposure to wafers when necessary. This shutter also serves to minimize UV exposure levels. Additionally, the tool features a built-in exhaust ventilation asset and an exhaust control module to ensure that hazardous vapors are discharged safely. Overall, CANON CDS-650 is a reliable photoresist model capable of forming thin film patterns with first-rate resolution and precision. Its superior optical equipment, reagent-based photoresist solution, and user safety features make this system a top choice for demanding microelectronics applications.