Used CANON CDS-650 #9111494 for sale

CANON CDS-650 Photoresist Equipment is a leading edge technology for the development of high-resolution semiconductor wafers. The system combines the application of photo-resist (PR) and lithography technologies to deposit variable thickness PR films on semiconductor substrates. CDS-650 Photoresist Unit is especially suited for semiconductor production and research and development applications. CANON CDS-650 Photoresist Machine is equipped with a modular resist station, which comprises of the Spin/Developer Module and the Exposure Module. The Spin/Developer Module contains a spin coater equipped with a motorized spin coater and bubbler, and features digital temperature, RPM, and timer controls. The Exposure Module houses the photolithography exposures, which are completely enclosed to reduce the effects of heat dissipation and ambient temperature on the resist. CDS-650's intuitive software interface facilitates direct manipulation of the process parameters, allowing users to easily select and precisely adjust their settings. This eliminates the need for external control systems or complex setup. Once the desired parameters have been set, the tool loads the dataset, automatically configures all the process parameters, and then manages the entire process for improved consistency between batches. CANON CDS-650 also features an image analysis asset that eliminates the requirement for manual visual inspection of resist profiles. This model takes a series of images of the resist and Automatically analyzes the height, orientation, thickness, and uniformity of the resist, thereby enabling quick confirmation of characteristics and improved control of the entire process. In addition to the Spin/Developer Module and Exposure Module, CDS-650 Photoresist Equipment is also equipped with a resist-ready storage and storage-compensated wafer transfer system, which increases the productivity of the unit. This wafer transfer machine facilitates optimal resist redistribution and deposition strategies, as well as quick restart of wafers and storage compartments to maximize throughput. CANON CDS-650 Photoresist Tool offers superior throughput with maximum film thickness coverage, providing precise accurate wafer production that meets the highest industry standards. With its advanced technologies and intuitive user interface, CDS-650 Photoresist Asset is ideal for producing high-resolution semiconductor wafers.