Used CEE 150CB #9147039 for sale

CEE 150CB is a high quality photoresist photomask equipment designed to produce high-quality microphotolithography structures. It is a two-part system consisting of a photoresist emulsion and a light-sensitive photoresist emulsion. The photoresist emulsion contains a mixture of solvents, additives, binders, and photoactive compounds (PAC). The light-sensitive emulsion is composed of four different light-sensitive materials. When exposed to light, these materials react with the PAC and form a photoresist layer on top of the substrate. The photoresist layer serves as a mask for the photolithography process. After the exposure, an etched structure is created in the photoresist layer using a photolithograph machine. The photoresist layer is removed with a solvent, leaving behind only the etched features of the desired structure. The light-sensitive emulsion of 150CB provides high sensitivity, excellent adhesion, and exceptional resolution during the photolithography process. This makes the unit suitable for a variety of photolithographic applications, including semiconductor device fabrication, optical fiber communication, and thin-film microsensors. The preparation of the photoresist layer is also made easy by the high-quality emulsion of CEE 150CB machine, as the photoresist layer is highly uniform and free of defects. This keeps the etch mechanism clean, ensuring high-quality results. Finally, the highly sensitive light-sensitive emulsion of 150CB tool also ensures a low cost of ownership, as only a small amount of exposure time and photoresist are needed for the entire photolithography process. This makes it ideal for small-scale applications, where budget is an important consideration. All in all, CEE 150CB is a reliable photoresist photomask asset that offers high-quality results at an affordable price. It is suitable for a variety of photolithography processes, providing a versatile solution for microphotolithographic structures.