Used CEM 1800ES #9309472 for sale

Manufacturer
CEM
Model
1800ES
ID: 9309472
Strip plating system.
CEM 1800ES is a highly advanced photoresist equipment designed for use in precision engineering. It is a versatile, turnkey system that combines advanced optics with computerised control for precise and consistent lithography results. 1800ES is designed to produce high resolution photomasks with ultra-precise alignment, registration, resolution and overlay capability. These masks allow for high-resolution imaging of integrated circuits and electronic components. The unit features advanced opto-mechanical components and software that enable precise control over the patterning process. The machine has a linear stepper for high resolution imaging with over 1800 revolutions per trilayer. The scan field determines the maximum field for patterns to be imaged. The scan field is made up of multiple subfields which can be individually programmed and optimized for different patterning requirements. CEM 1800ES is compatible with various photoresist materials such as soluble, negative tone, aluminium on silicon nitride, and e-beam resists. It also has a vacuum tool for controlling aerosols. A unique feature of 1800ES is its fast exposure cycles. It can perform up to 24 patterning layers in a single exposure cycle while maintaining alignment accuracy of up to 2 microns. The asset has an adjustable depth of focus, which helps to ensure the highest quality images. It also has adjustable focus position, making it ideal for imaging processors and wafer level packages. The model has a powerful controller that is based on a Linux platform, and provides a range of patterning functions. Parameters such as exposure time, exposure dose, stepper speed, alignment accuracy, and depth of focus are all programmable. CEM 1800ES photoresist equipment is a powerful tool for precision engineering. It offers a wide range of features and functions that make it ideal for precise patterning of integrated circuits and electronic components. Its fast patterning cycle, adjustable depth of focus, and advanced opto-mechanical components make it a highly versatile system for a variety of applications.
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