Used CHEMACOUSTIC PAD-200 #9187709 for sale

CHEMACOUSTIC PAD-200 is a photoresist equipment engineered for the creation of high-resolution components and features in a variety of materials. This system utilizes a vertically oriented, stepper motor-based masking unit to precisely expose a photosensitive polymer-based liquid film material (known as photoresist) to ultraviolet radiation. This results in a thin, light- and heat-sensitive film that enables the formation of intricate features such as resistors, integrated circuits, LEDs, and other electronic components. PAD-200 has several adjustable parameters that allow users to tailor the sensitivity of the photoresist to specific project needs. These parameters include light exposure time, exposure angle and speed, direct current power input and frequency, as well as post-exposure drying time. Collectively, these parameters can be used to produce features as small as 3 μm in lateral dimensions, with step heights within a few nanometres. Additionally, the machine can produce features with excellent alignment accuracy, straightness, and depth control, enabling the creation of complex electronic components. CHEMACOUSTIC PAD-200 also features two high-resolution cameras to provide the precise guidance needed to create the most detailed features. Combined with a sophisticated computer control tool, these cameras take optical feedback on the masking and exposure processes to provide users with detailed information regarding the position and condition of photosensitive materials and features being produced. Overall, PAD-200 is a powerful tool for creating very small and intricate components. Its adjustable parameters and high-resolution cameras make it capable of producing features with superior alignment accuracy and straightness. Additionally, its capacity to handle light- and heat-sensitive materials makes CHEMACOUSTIC PAD-200 a valuable tool for creating complex electronic components.