Used CHEMALUX 100 #9246757 for sale

CHEMALUX 100 is a photoresist system designed by SAG Associates that provides a uniform platform for development of complex integrated circuit patterns. It is composed of two primary components: the binding monomer and the curing agent or initiator. When combined in a specific ratio, the binding monomer and initiator react quickly to form a hardened film just moments after exposure to light. This hardened film provides an improved barrier against chemical attack and moisture, making 100 an ideal photoresist for semiconductor applications. CHEMALUX 100 resists the acids and alkalis used during lithography steps, providing unmatched resolution during device fabrication. The photoresist can be tailored to the exact specifications of a project or device, allowing for very small features to be patterned and etched easily and accurately. The main advantage of 100 is its deposition speed. It spreads across a substrate quickly while providing a uniformed layer of photoresist to resist etching and post-processing. CHEMALUX 100 is stable enough to be patterned with an electron beam, allowing for extremely fine feature sizes (as small as 50 nm) to be formed. This provides superior insulation as well as dimensional stability. The processability of 100 is excellent, providing for easy printing, coating, and imaging of the photoresist. Its high resolution enables it to be used with a wide range of laser and optical imaging systems. Its chemical properties, along with its ease of use, make it an ideal photoresist for deep etching, high temperature treatments, and complex masks. In summary, CHEMALUX 100 is a well-rounded photoresist system that can be tailored to suit a variety of needs. Its high resolution, easy processability, and uniform deposition make it an excellent choice for all kinds of semiconductor applications. Its stability and chemical resistance are impossible to beat, making it the go-to choice for integrated circuit patterning and device fabrication.