Used CHEMALUX 300 #9253608 for sale

CHEMALUX 300 is a photoresist equipment that allows for the production of a chemical resistant coating on a wide variety of substrates. The system is comprised of a negative resist, usually a polymeric material, onto which a positive photoresist is applied. 300 is a multi-layer unit, with the negative resist being applied first and then the photoresist is applied onto the negative layer. The photoresist is a photosensitive, light-sensitive polymer that will only react when exposed to radiation in the UV-C spectrum. This allows for precise patterning and photolithography. CHEMALUX 300 photoresist machine consists of a semi-aqueous developer, a chemical solvent, and a presensitization coating that contains a photosensitive compound. When this tool is exposed to UV light, a light-induced reaction occurs, and an interactive resist layer is formed. The resist layer functions as a "chemical shield" that protects the substrates below from any reactive chemical processes. The resist layer also provides an excellent base for further processing. By masking off certain areas of the substrates, using a light-blocking material, one can produce a desired pattern. 300 offers excellent adhesion and chemical resistance properties, making it ideal for a variety of substrates including glass, metal, silicon, and diamond. It offers significant advantages over traditional metal masking techniques and allows for very precise and complex patterning. Additionally, CHEMALUX 300 is unaffected by temperatures up to 200°C, so it can be used for a wide range of applications including etching and depositing. To use the photoresist asset, the substrate is first sensitized with either a hydrochloric acid solution or a solvent. This prepares the substrate for the photoresist. The photoresist is then applied and allowed to dry. Once the photoresist has been applied, an exposure light source is used to pattern the substrate. 300 resist model is highly sensitive and allows for very precise patterning. Finally, the substrate is immersed in a developer solution to complete the process. CHEMALUX 300 is a very versatile and reliable photoresist equipment. It is fast, efficient, cost-effective, and provides excellent adhesion and chemical resistance. Thanks to its high sensitivity to UV light, 300 can be used for a variety of processes, including etching and depositing. The photoresist system is commonly used in the production of semiconductor devices, flat panel displays, and photolithography components.