Used CHEMALUX PSR 300 #9253609 for sale

CHEMALUX PSR 300 is a high-performance photoresist equipment designed for use in a variety of applications. Photoresists are chemical systems designed to interact with light sources to allow for the production of image patterns on a variety of substrates. This particular system uses a light source of typically 450 - 490 nm wavelengths, and is able to generate images with minimum line widths of less than 1 micron. PSR 300 photoresist unit is divided into two parts: the components involved in the coating and exposure process, and the components involved in developing and other post-processing steps. The coating and exposure components include a dispense unit, a roll-coater, and CAT 500 Programmable Light Exposer. The dispense unit allows for the precise flow control necessary for coating substrates with a uniform and consistent layer of photoresist. The roll-coater then spreads the photoresist in a thin, uniform film. The CAT 500 Programmable Light Exposer then utilizes a programmable laser to shine light onto the photoresist, exposing the substrate with specific patterns. The developing and post-processing components of this machine include a rinse station, a sulfuric acid plasma stripper, and a developer tank. The rinse station ensures that the substrates are cleaned before they are processed. The sulfuric acid plasma stripper is used to remove the photoresist layer from the substrate. Finally, the developer tank is used to dissolve any remaining photoresist on the substrate, completing the imaging process. CHEMALUX PSR 300 photoresist tool provides users with consistent image production, highly precise image patterns, and a wide range of substrates that can be exposed. This asset is capable of producing a variety of applications, such as microelectronics, medical devices, and printed circuits. In addition, the simplified operating controls of this model make it easy for users to get up to speed quickly.