Used CIBA GEIGY CLD 3 #94697 for sale

CIBA GEIGY CLD 3 is a photoresist equipment developed by CIBA GEIGY corporation. It is a negative acting photoresist, meaning that unexposed areas can be removed and exposed areas remain, allowing the creation of patterns in the photoresist by selectively exposing and then etching away the unwanted parts. This system is designed specifically for producing fine, intricate, and highly accurate patterns, such as those found in integrated circuit designs. It works by coating onto the surface of the substrate a thin film of photosensitive material. This film is then selectively exposed to light which decomposes the exposed material and leaves the unexposed material unaffected. The exposed material is then removed using a chemical solvent, etching process, or other method. The remaining portion of the photoresist acts as a mask for further etching or processing. In the case of CLD 3, the photoresist is composed of a novel formulation that makes it highly stable, with minimal post exposure shift, and strong etch resistance. When correctly exposed and developed, CIBA GEIGY CLD 3 photoresist unit provides excellent resolution and straightforward processing. The minimum feature size achievable is dependent on the equipment being used, but can be as small as 0.25 microns in size. It also has high contrast printing, meaning that the photoresist layer can be subjected to stronger etching solutions, resulting in more reliable etch results. This machine also offers a range of flexibility, as it can be used with many different substrates, including glass, metal, plastic, and semiconductor materials. In short, CLD 3 photoresist tool is an industry standard for creating fine, intricate, and highly accurate patterns for integrated circuits and other purpose-specific devices. It is reliable, stable, and capable of producing features as small as 0.25 microns in size, can be used on a range of substrates, and provides excellent contrast and etch resistance.