Used CLEAN AIR PRODUCTS CAP1411-636-36H #293592370 for sale

CLEAN AIR PRODUCTS CAP1411-636-36H photoresist equipment is an advanced and efficient tool for creating photomasks and other photolithography projects. It is based on a top-down patterning approach and utilizes a sophisticated photoresist developed specifically for this application. The interface is intuitive and easy to use, allowing for quick and precise setup of the photoresist application parameters. The system is built on a six-point single die platform and features a high-efficiency three-jaw chuck for reliable die chuck and positioning. The unit employs a diode-array illumination light source with a near-laser spot size and an integrated integrated optical beam profile generator for optimum dose uniformity. An immersible LED controller and a multi-stage in-situ bake chamber provide reliable and repeatable performance. Additionally, the adjustable exposure time and advanced exposure control parameters allow for fine-tuning of the application. The built-in resist unit is equipped with individual stage temperature controlled resist units, allowing for temperature-controlled application of the photoresist. Additionally, the resist unit is equipped with a built-in spin-coat run that creates a uniform layer of photoresist. The machine can handle a range of substrates of up to 6-inch in size, and the high-precision mask aligner enables production of large volumes of photomasks and photomasks with accurate feature sizes. Additionally, the tool is equipped with advanced digital image processing and defect detection capabilities, providing high-quality patterns with repeatable results. The asset also features a two-step post-exposure bake which helps eliminate resist swelling and corrosion and improves springback and adhesion of exposed features. Moreover, the model offers features such as a quartz crystal sensor for real-time monitoring, a monochrome CAL CD-ROM, and a multi-user computer control equipment with password protection and audit logs. CAP1411-636-36H photoresist system provides a fast and efficient platform for creating high-precision photomasks for a range of lithography applications. Its intuitive user interface, advanced exposure control parameters and digital image processing capabilities make it an ideal choice for any photolithography project.