Used CND PLUS CIE-2C02(04)-C #9223039 for sale

CND PLUS CIE-2C02(04)‑C is a photoresist system based on the positive CIE-2C02(04) developed for the photolithography process. It provides superior etching and chemical resistance properties over conventional positive photoresists, allowing for precise and uniform structuring of circuit patterns with low defect rates. The resist is based on a blend of three components—a crosslinkable polymer, a light and oxygen blocker, and a photoactive compound (PAC). The blend is combined with other photo-chemically and thermally stable compounds to create a radiation-sensitive emulsion. When exposed to light or radiation, the emulsion converts the energy into a latent image. The light blocking agent helps reduce the formation of unwanted background images, while the PAC increases the adhesion of the resist. The crosslinkable polymer helps to protect the resist from photocatalytic degradation, improving its stability. When exposed to light, the latent image is amplified by the PAC, which initiates the polymerization of the resist. The amplified image helps to create a high-resolution pattern with accurate and precise line widths. During post-exposure bake (PEB), the generated heat below or above the melting point of the resist helps to further amplify the latent image, leading to better resolution. CND PLUS resist features excellent resist and etching properties, with resistance to both basic and acidic etch chemistries. It also features improved wet etching and film adhesion to numerous substrates, with minimal background sloping and low defect rates. The resist is compatible with standard photoresist processing, including anti-reflective coating, post-exposure bake, and post-development bake. It also offers improved shelf life and storage stability over conventional photoresists, allowing for longer-term storage ability. In summary, CND PLUS CIE-2C02(04)-C is a positive photoresist system designed to provide high resolution, precision, and uniformity for lithography processes. With its excellent etching, adhesion and storage properties, the resist provides a reliable alternative for the fabrication of circuit patterns with minimal defect rates.