Used CND PLUS CIE-2C3D02(04)-2 #9144079 for sale

CND PLUS CIE-2C3D02(04)-2 is a high performance photoresist equipment designed for deep UV (DUV) exposure applications. This system offers outstanding performance and advanced features to make lithographic processes in critical deep UV/ photolithography applications easy and more efficient. CND PLUS CIE-2C3D02(04)-2 photoresist unit consists of a UV-sensitive photopolymer that is highly reactive to UV radiation and designed for ultra-resolution imaging. The two components in this machine, an alkali-soluble photoresist and an organic solvent developer, produce an extremely durable, high-resolution image. The photoresist is formulated to have excellent adhesion to the substrate and be resistant to both acid and base cleaning processes. The developer provides the optimal exposure conditions and a high contrast between exposed irradiated and unexposed areas, making it suitable for deep UV lithography applications. CND PLUS CIE-2C3D02(04)-2 photoresist tool also features a wide range of other properties that make it an ideal choice for advanced lithography applications, including high transparency, low stripping rate, exceptionally low sensitivity to both acid and base, and high sensitivity to all wavelengths of UV light. It is easily mixed and applied directly to the substrate, making the imaging process straightforward and efficient. Furthermore, CND PLUS CIE-2C3D02(04)-2 photoresist asset offers an excellent etching resistance, making it suitable for use in a variety of direct imaging lithography processes. CND PLUS CIE-2C3D02(04)-2 photoresist model is the perfect choice for applications requiring high resolution and rugged reliability in high-quality deep UV lithography applications. Its high usability, fast exposure time, and excellent image resolution make it an ideal choice for use in a plethora of DUV lithography applications, ranging from semiconductor fabrication to MEMS and microelectronics.