Used CND PLUS CIE-3C02(04)-C #293642075 for sale

CND PLUS CIE-3C02(04)-C is a photoresist equipment consisting of a photoresist and a developer, formulated for use in the fabrication of electronic components. It is particularly suited for advanced lithographic processes such as direct write laser photolithography, direct write e-beam lithography and other precision lithographic processes. The photoresist system consists of a polymeric substrate and a photo-sensitive active layer. This layer is optically triggered by either synthetically produced UV light or electrons. When exposed to the appropriate radiation, a chemical reaction takes place that changes the molecular structure of the polymer substrate. This reaction results in a molecular shifting in the polymeric film, providing relief structures in the film. The relief structures are then developed in the appropriate solvent solution. The developer applied to the photoreceptor layer is a 3-component one containing diethylene glycol monobutyl ether, t-butyl methyl ether, propylene glycol and a surfactant. This allows for the full development with reliable removal of the entire resist layer. Since the developer is insoluble in water, it does not dissolve any unwanted residues. The photoresist unit provides a high sensitivity, making it suitable for patterning high aspect ratio features. It is also resistant to thermal shock, making it ideal for fabrics requiring elevated anneal temperatures. The photoresist machine is designed to provide accurate and uniform pattern replication and high resolution features with lithographic processes. The resist layer imparts excellent adhesion to the substrate and chemical resistivity, allowing the substrate to remain clean of chemical contaminants. The photoresist layer constructed with CND PLUS CIE-3C02(04)-C will remain stable across a broad range of chemical and mechanical exposures, as well as thermal and radiation exposures. The molecular shifting in the substrate also enables accurate and repeatable pattern replication, ensuring consistent results from identical set of procedures used in manufacturing. The photoresist tool of CND PLUS CIE-3C02(04)-C is highly economical, making it an ideal choice for a wide range of electronic components manufacturing operations. Its excellent performance in lithographic processes, combined with its chemical and mechano-chemical resistivity, adhesive and radiation stability makes it an ideal photoresist asset for electronic device fabrication.