Used CND PLUS DAVID 2015 #9359656 for sale

CND PLUS DAVID 2015
Manufacturer
CND PLUS
Model
DAVID 2015
ID: 9359656
Coater system.
CND PLUS DAVID 2015 is an advanced photoresist equipment used in the IC fabrication process. Photoresist is a type of light-sensitive material, typically a resin or polymer, used to create an imprint onto a substrate or semiconductor chip. This type of system is used to selectively add, remove, and modify the shapes of electrical components on a substrate. DAVID 2015 is an automated unit that is made up of several components and includes the developer, exposure data preparation, optical point-of-view machine, and the process control tool. The developer station uses a spray or dip-coating process to coat the photoresist onto the substrate. Once the photoresist is applied, the exposure data preparation station optimizes the photomask pattern for use in the process. The optical point-of-view asset allows the photomask to be precisely aligned to the substrate. Finally, the process control model monitors the entire photoresist process to ensure that the substrate is processed correctly and makes any necessary adjustments. CND PLUS DAVID 2015 is capable of working with many types of substrates including a variety of semiconductor wafers, thin-film substrates, and circuit boards. It can also be used for both front-side and back-side exposure of the photoresist, allowing for circuit features and fine details to be accurately created. Through its highly automated and streamlined IC fabrication process, this equipment is capable of producing complex patterns at high speeds and with a high level of accuracy. This photoresist system is a practical way of manufacturing integrated circuits quickly and with a moderate amount of complexity. Its various components, such as the developer station, exposure data preparation station, optical point-of-view unit, and process control machine all work together to create photoresist circuits with reliability, precision, and high yield. DAVID 2015 also provides an efficient and cost-effective approach to photomask patterning.
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