Used CND PLUS DAVID #9204279 for sale

CND PLUS DAVID is a sophisticated photoresist equipment that combines cutting-edge technology with rich automated features. The system utilizes an automated processing unit that helps eliminate human errors caused by improper chemical mixing, temperature control, and exposure time assessment. It features a temperature-controlled chemical mixing and distribution machine that dispenses highly accurate photoresist, developer, and post-development materials. Additionally, the tool includes a diffusion lamp specifically designed for photo-responsive materials and it is compatable with large-area photolithography platforms. The implemented optics enables the resolution of both large and small images. A web-based graphical user interface (GUI) offers users customization capabilities, highly accurate resolution settings, previewing and real-time control over the photo-sensitive material's structure. The GUI also helps users adjust various parameters and easily design and customize their photoresist patterns or designs. The built-in data acquisition asset automatically collects results of the exposure and post-processing steps and allows users to store this information for further analysis. DAVID photoresist model features a fast-drying technology to help improve photo-response time. This helps to reduce the risk of errors associated with lamination, and also increase the process efficiency and cost savings. Moreover, the equipment displays information such as photosensitive material run times, dry times, and compatible dyes in both graphical and numerical format. The system includes an efficient cleaning and maintenance unit that helps eliminate corrosion, reduce maintenance costs, and maintain the photoresist machine's perfect performance. The tool also features several fault detection mechanisms to ensure proper operation, and it supports various safety procedures such as emergency stop and fail-safe shutdown to prevent accidents. With these advanced features, CND PLUS DAVID photoresist asset can tackle virtually any photoresist application, from pattern generation to developing large chip prototypes. Its integrated automated model allows users to achieve fast turnaround times, accurate results, and low costs, making it ideal for any photolithography application.