Used COMET CDH-5010 #9223055 for sale

COMET CDH-5010 is a photoresist equipment designed for efficient wet develop and strip applications. The system includes two main components: the photoresist and the developer. The photoresist is a light sensitive material that is applied to the substrate during the lithography process. By exposing the photoresist to UV light, specific areas of the substrate can be activated, which will then be developed into the required pattern. The developer then removes the unwanted photoresist material from the substrate, leaving behind the desired pattern. CDH-5010 photoresist unit is particularly well-suited for Chip-on-Glass (COG) substrates. Its advanced coating technology provides accurate control over the thickness and uniformity of the photoresist on the substrate. This control ensures high-fidelity patterns with detailed features for a wide range of substrates. In addition to its precision, COMET CDH-5010 photoresist machine offers excellent wet develop and strip performance. The developer uses a powerful, low-foaming surfactant formulation that helps ensure uniform coating thickness while protecting the sensitive underlayers from degradation. Furthermore, the efficient strip cycle minimizes damage to surrounding substrates or excess consumption of developer chemicals. The tool includes a robust and easy-to-use developer-refill process that helps ensure continuous production and cost savings. The high degree of repeatability and reproducibility achievable with CDH-5010 makes it a truly valuable tool for wet-develop photoresist applications. Overall, COMET CDH-5010 photoresist asset is an ideal choice for accurate, high-resolution patterns with clean edges and high fidelity, making it an ideal choice for Chip-on-Glass substrates. Its outstanding performance in both wet develop and strip applications ensures quick cycles and minimal damage to the substrate. The model also features a refill process for cost-effective production and the opportunity to maximize profits.