Used CONVAC 1001 HK #9099868 for sale

CONVAC 1001 HK is a revolutionary photoresist equipment designed to provide precise etching for fine patterns on various substrates. The system consists of a light source, a beam controller, a lens unit, and a focus monitor. A photo mask, which can be designed from a computer or manually, is used to control the beam path. The light source is equipped with an X-band infrared laser, which is capable of generating a high power beam to help etch the pattern. This infrared laser also contains a self-calibrating machine, allowing for improved accuracy and repeatability of the pattern being etched. The beam controller, which is capable of adjusting the beam's intensity and power based on the photo mask design, controls the laser's power. This provides for precise control over the etching process. The lens tool contains a series of lenses to focus and control the laser beam for optimal etching. Using high-precision optical elements, the laser beam is focused onto the substrate to etch the smallest details of the design. The focus monitor is also used to check the accuracy and repeatability of the etching process. 1001 HK comes with a variety of other useful features, such as an anti-reflective coating on the lens asset, which increases the efficiency of the laser, a computer-controlled autofocus model that maintains accuracy regardless of the pattern's size and complexity, and an automated mask creation equipment. Overall, CONVAC 1001 HK is an incredibly precise, versatile photoresist system capable of etching complex patterns with extreme detail. Its unique features allow for a high degree of customization and accuracy for the user, providing for complex designs that are quickly and accurately etched onto any substrate. 1001 HK is the perfect tool for fabricating intricate patterns quickly and accurately.