Used CONVAC 6000 #26871 for sale

CONVAC 6000 is a high performance industrial photoresist equipment designed for photolithography in the microelectronics manufacturing industry. The system is comprised of an illumination subsystem, a mask subsystem, and a resist coating and development head. The illumination subsystem uses two F2 excimer laser sources delivering energy up to 550mJ/ cm2, frequency up to 400kHZ, and spot size up to 3um for front side illumination. The illumination subsystem also includes a variable gap laser cell, laser power supplies, and a shutter. The mask subsystem features an automated vacuum mask changer, and an automated quartz mask exposer. The exposer enables multiple lighting angles and exposure times, in both bright and dark field patterns. The resist coating head is designed to provide superior uniformity across a wafer. It is capable of coating up to 300mm parts with thick films, as well as thin films, with equal accuracy and precision. The resist coating utilize a solenoid-actuated automated valves, which provide precise flow rate, pressure, and temperature for each step of the coating process. The development head of 6000 features a quadrupole based atomized sprayer, which facilitates uniform development times across all parts in the wafer. The atomizer sprays solvent-base etching media at the resist surface, and allows for advanced resist removal techniques such as stereotactic etching. Overall, CONVAC 6000 unit is a reliable and compact photolithography machine that is ideal for high precision production, allowing for maximum throughput. Its automated mask handling, variable lighting angles, and precision resist deposition, makes it ideal for continuous high productivity in microelectronic design.