Used CONVAC CBA-1-1M-2000 #293747947 for sale

CONVAC CBA-1-1M-2000 photoresist equipment is a high-precision exposure and deposition system designed for the patterning of smaller precision samples and components. This unit combines features of both photolithography and vacuum deposition in order to provide the user with effective and efficient results. CBA-1-1M-2000 features a 14-layer evaporator and 6-inch mask-aligner platform for the deposition of dielectrics and metals. The evaporator allows up to sixteen simultaneous deposition zones for multi-layer deposition. This feature allows for the patterning of smaller and more complex components and deposition of uniform thick films over larger areas. An illuminated mask aligner ensures precise alignment of the mask to the substrate, allowing for the deposition and patterning of features with fine details and high accuracy. A wide range of materials can be used for these applications, and the machine can be adjusted for different exposure parameters in order to achieve the desired effect. CONVAC CBA-1-1M-2000 also features a range of deposition techniques suited to more complicated samples and components. The integration of these techniques, including spin coating, spray coating, and slot coating, allows for the precise deposition of conformal films with uniform thickness. This allows for the deposition of metal and dielectric layers for the reliable protection of a wide range of components. CBA-1-1M-2000 is designed to maximize throughput and minimize tool downtime, with an automated asset for collection of process data, and a comprehensive tracking model for sample disposition. The equipment is also equipped with backup storage, allowing for the backup of processes and data in the event of system failure or downtime. This unit is designed to be highly efficient and cost-effective, making it a valuable tool for a wide range of research and industrial applications.