Used CONVAC CBA-M-2000-U #9152187 for sale

Manufacturer
CONVAC
Model
CBA-M-2000-U
ID: 9152187
Wafer Size: 4"
Vintage: 1995
Spinner / Coater, 4" Square substrates 1995 vintage.
CONVAC CBA-M-2000-U is a versatile photoresist equipment designed for a wide range of substrate processing. It is capable of lithography, chemical etching and sputtering processes on a variety of wafer substrates, including glass and polyimide. The system is an optical lithography tool, which utilizes projection exposure optics to project radiation onto a substrate using a mask or photomask containing patterns for lithographic etching of a specific area of the wafer. The unit utilizes a linearly focused projection lens to focus photons onto a substrate, creating a pattern over a specified area. The lens has an adjustable numerical aperture (NA) of 0.43, and is designed to image substrates over a wide range of sizes, from 5.7mm to 500mm. The lens can be adjusted to accommodate different exposure wavelengths, including visible and ultraviolet light sources. The lens can also be configured to work with both 4- or 6-inch wafers. For patterning of the wafer, the machine's software enables users to design photomasks that specify the targeted regions for lithographic and etching processes, as well as setting the exposure energy and dose. The tool features a high-end precision alignment asset, with an alignment accuracy of 0.5 micron, making it suitable for high tolerance applications. The tilt and rotation of the wafer can also be fine-tuned manually to ensure optimal performance of the optics. The model's exposure stage provides consistent accuracy and repeatability, and allows for exact positioning of the wafer with respect to its original reference point. The equipment offers built-in chemical etching capabilities that allow for a variety of sputtering and lithography techniques. The system contains a selectable sputter power of up to 10 kW, and the sputter time can be adjusted to the substrate size and desired results. Additionally, the unit allows for lamination of the substrates using protective films, such as resist materials. Overall, CBA-M-2000-U is a highly advanced photoresist machine that can be used in a wide range of applications. Its durable and robust features, combined with its easy setup, make it an ideal choice for users wanting to take advantage of high-precision photolithography.
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