Used CONVAC CBA-M-2000 #293747948 for sale

CONVAC CBA-M-2000 is a photoresist equipment designed to deposit thin films of photoresist material onto substrate surfaces. It is a user-friendly system which is widely used in the fabrication of complex circuits and is suitable for both semi-automatic and fully automated production processes. The unit is capable of controlling two independent deposition units, with each unit featuring a beam deflection machine to enable precise resist patterns to be created. Utilizing energized particles such as electrons, gallium ions or xenon ions, CBA-M-2000 is capable of achieving a resolution of up to 0.1 micrometers, making it an ideal tool for the production of high-precision circuits. In order to ensure the highest accuracy of resist deposition, CONVAC CBA-M-2000 offers a wide range of operating parameters. These include the choice of protective or etching deposition modes, the ability to choose between a wide range of beam currents and beam energy levels, as well as adjustable electron beam filtering and scanning parameters. The tool also offers multiple pattern generation modes and the ability to program coordinates semi-automatically or manually. For user convenience, CBA-M-2000 features a variety of safety features, including a gas interlock asset, a set of safety interlocks, an emergency button, a proximity warning model and a data logging equipment. It is also capable of executing advanced software instructions, allowing for easy integration with existing production systems. With its user-friendly interface and interactive graphics, CONVAC CBA-M-2000 is an excellent choice for those wishing to utilize a reliable and efficient photoresist system.