Used CONVAC CEA-M-2000 #293747949 for sale

CONVAC CEA-M-2000 photoresist equipment is a high-performance, multi-functional, multi-layer photochemical production system designed to create and process photoresists. Photoresists are used in the fabrication of semiconductor and optoelectronic devices and integrated circuits, and CEA-M-2000 is specifically designed to offer one-step lithography and etching processes for deep ultraviolet and extreme ultraviolet back-end applications. It features a compact and modular structure, with a horizontal conveyor mechanism and large-capacity substrate handling capabilities. CONVAC CEA-M-2000 is capable of producing and processing photo resists with different materials including polysilicon, silicon dioxide, and polycrystalline diamond. Its modular design offers a wide range of exposure options, including projection, contact or proximity printing, and digital exposure. The unit also provides for enhanced uniformity and resolution due to its feature-rich photoresist development, post-processing, and control systems. Furthermore, the machine is capable of mask-to-wafer alignment, with the use of a unique DC servo scanning platform. In addition, the tool offers a wide range of features for cost reduction and process optimization. It provides a smart planarization asset for etching, which enables users to optimize the etch parameters in order to achieve desired etch profile. Furthermore, it features a state-of-the-art dry etching technique, which enables users to lower costs and reduce etch times. The model also offers a wafer uniformity scanning equipment, which can measure the exact amount of etching and exposed area on each wafer. CEA-M-2000 photoresist system is designed to meet the requirements of modern semiconductor and optoelectronics industry. With its high-performance components and automated photoresist processing, it brings users unprecedented lithography and etching capabilities for device manufacturing. This unit helps users reduce their photoresist production cost and time, to increase yields and boost throughput. The machine is highly reliable and extremely robust, with the ability to tolerate ruggedly working conditions and high temperatures.