Used CONVAC CRH 9S #54531 for sale

CONVAC CRH 9S Photoresist Equipment is a powerful and precise tool for drinifying and recoating photoresist in the semiconductor industry. The system is designed to provide customers with the latest cutting-edge technology to enable them to achieve their manufacturing goals. The unit is a combination of a variety of different components, each performing its own task to ultimately produce a precision photoresist film. The components of CRH 9S are comprised of a transport vacuum chamber, a resist vaporizer, a cascade chamber, an aerosol mist concentrator, a condenser and a drum recoat machine. The transport vacuum chamber is a chamber into which the photoresist is loaded. Once inside, the photoresist is exposed to a vacuum, which removes any volatile components from the resist and ensures a uniform deposition. The resist vaporizer is a component which works to evenly distribute the resist onto the substrate material. The heated vaporizer is capable of accurately clinging to the surface of substrate materials and then simultaneously carrying out thermal deposition, allowing the resist to form an even film with a uniform thickness. The cascade chamber works to evenly disperse the resist droplets and then further distribute the resist onto the substrate material at a fast, consistent pace. The cascade chamber also aids in controlling the uniformity of the resist by keeping the droplets small and evenly distributed over the substrate. The aerosol mist concentrator works to remove any foreign particles from the concentrate droplets while they are being circulated in the cascade chamber. This component also facilitates in ensuring the resist consistency and uniformity. The condenser is what powers the aerosol mist concentrator, as it condenses and cools the resist. The condenser also helps regulate the resist temperature to prevent it from boiling over into droplets. Finally, the drum recoat tool is used to help evenly and quickly recoat the substrate material. The drum recoat asset can also help reduce defects on the resist film by increasing the repeatability of the substrate recoating. In conclusion, CONVAC CRH 9S Photoresist Model is a powerful and precise tool for drinifying and recoating photoresist in the semiconductor industry. This equipment is comprised of a transport vacuum chamber, a resist vaporizer, a cascade chamber, an aerosol mist concentrator, a condenser and a drum recoat system. All of these components work in combination to produce a precision photoresist film with excellent uniformity, consistency and repeatability.