Used CONVAC LBA 7 #9177469 for sale

CONVAC LBA 7 is a Photoresist Equipment specifically designed for advanced semiconductor device fabrication processes. It is capable of a number of sophisticated features including resist coating, spinning, baking, and developing of photoresist layers used in the integrated circuit manufacturing process. The system also features an advanced three-axis scanning stage which is used for photolithography. The resist coating provided by LBA 7 features a unique solids fraction adjustment feature to provide highly uniform film thickness. The spinning process is capable of speeds ranging from 100 to 3500 RPM and offers selectable acceleration and deceleration rates, aerodynamic spin rate stabilization, and average centrifugal force sensors for precise control. The user-friendly baking unit has an adjustable temperature range of 50 to 400°C with a temperature uniformity of ±0.5°C over the substrate. For developing, the unit has an adjustable developer temperature range of 10 to 40 °C for optimal results when processing a wide range of photoresists. For the scanning stage, CONVAC LBA 7 offers an excellent repeatability of 0.5 µm, and a highly accurate acceleration and velocity control. This allows for highly accurate and precisely placed patterns on substrates. An ultra-accurate XYZ manual alignment machine is also included which offers a fine positional accuracy of ±0.1 µm. The tool also has a programmable exposure function to integrate with any automatic photolithography equipment. LBA 7 is designed to be a highly efficient, user-friendly and cost effective asset for the fabrication of a wide range of photoresist layers required for the integrated circuit manufacturing process. It features top-of-the-line resist coating, spinning, baking, and developing performance which can be accurately automated for optimal output. The user-friendly design and advanced scanning stage make it the ideal choice for precise photolithography.