Used CONVAC M 2000 #293585687 for sale

CONVAC M 2000 is a photoresist equipment for use in semiconductor processing. It is primarily used for microelectronic lithography applications, such as thin-film deposition, 3D etching, and printed circuit board etching. The system is designed to enable users to rapidly develop a variety of advanced semiconductor structures with high accuracy. CONVAC M2000 is able to rapidly move and precisely align a range of optical tools, such as steppers, scanners, and microscopes. This enables users to transform complex 3D shapes into accurate surface features on substrates. The unit can be configured for both manual and automated operation. M 2000 features a unique photo mask plate that can be used to generate exact patterns from any given design. The plate is composed of a polymer film and is sensitive to ultraviolet and x-ray radiation. Users select one or more photosensitive elements on the plate to generate the desired pattern. This can be achieved by exposing the plate directly to the source of radiation or by using a programmed device such as a stepper. The machine also supports various other processes that complement photoresist operations. This includes post-processing operations, such as ashing, doping, and sputtering. The tool also supports wet-etching, which enables users to etch more precisely within a structure. M2000 combines advanced capabilities with easy-to-use controls, providing a reliable and cost-effective way to perform high-quality photoresist operations. It is the ideal platform for both small labs and production lines due to its high-level of accuracy, flexibility, and scalability.