Used COST EFFECTIVE EQUIPMENT / CEE 4000 #9260033 for sale

COST EFFECTIVE EQUIPMENT / CEE 4000 is a photoresist equipment that is designed to create intricate and complex patterns on thin film substrates. This system consists of a illumination unit, development chamber, and a spinner. The illumination machine is the source of light for the photoresist material on the substrate. As the substrate passes beneath the illumination tool, the exposure is determined by the beam intensity and pulse duration of the light source. The development chamber is then used to further define the structural features formed by the illuminated photoresist film. This chamber utilizes an aqueous photoresist developer to selectively clean away the unexposed regions of the photoresist, while preserving the regions that have been exposed. This allows for precise control of the interaction between the illumination asset and the photoresist material. Lastly, the spinner is used to spin the substrate at high speeds during the development process. This helps to evenly distribute the developer across the substrate. As the substrate spins, the developer is moved away from the exposed region and the areas of unexposed photoresist are cleaned away. This helps to ensure that the desired patterns and features are formed correctly. Overall, CEE 4000 photoresist model is a reliable and effective tool for creating complex detailed structures on a variety of substrates. This equipment is highly tolerant of fluctuations in illumination, substrate speed, and developer concentration. This allows the system to produce intricate and precise patterns and features with consistent results every time. Additionally, the unit is compact and cost effective, making it an ideal option for anyone looking to create intricate patterns and structures.