Used CRESSINGTON 108 Auto #293768241 for sale

CRESSINGTON 108Auto is a photoresist equipment developed for the accurate and reproducible processing of wafers and other substrates. It is designed to handle a wide variety of photoresist deposition and processing operations. The system is equipped with a low temperature thermal evaporator, allowing for an even coating of photoresist onto the substrate. It uses a high precision planar nozzle module to ensure uniform distribution of photoresist throughout the substrate. The unit can work in both single and multi-module configurations, with 8 or 16 nozzle modules respectively. 108Auto offers precise temperature and pressure control during the development process, in order to ensure reproducibility and accuracy. It is furnished with an easy-to-use Graphical User Interface (GUI) for programming, monitoring, and executing jobs. The machine also includes software tools for aligning features, imaging and film evaluation. This ensures that the process is consistent between substrates and runs. For the dispense process, CRESSINGTON 108Auto is equipped with a Vacuum Photoresist Dispense (VPD) option. This allows precise and repeatable photo resists loading and dispensing. The tool can also be fitted with a wafer etch option, thus enabling etching of photoresist on the wafer surface. Additionally, the wafer cleaning module option allows for the removal of unwanted residue during the process. 108Auto is designed for use in standard cleanroom environments, and is class 100/ISO 5 compliant. It requires minimal operator training and provides improved user safety, courtesy of its intuitive design, ergonomic layout and advanced safety features. The asset is certified to a wide range of industry standards and is compatible with the SEMI Standard 300mm Factory Interface Specification. Overall, CRESSINGTON 108Auto model offers a reliable, robust and user friendly platform for the precise deposition and development of complex photoresist structures. It is an ideal choice for the production of wafers and substrates that require precision processing.