Used CRESSINGTON 108 Carbon/A #293656286 for sale

CRESSINGTON 108 Carbon/A photoresist equipment is an industry-leading photolithography technology used in the fabrication of semiconductor devices. Utilizing a carbon based organic vapor deposition (CVD) method, the system allows for precise control over the deposition of a carbon-based photoresist material onto a wafer substrate. This provides a high degree of uniformity in terms of the characteristics and quality of the deposited photoresist. The unit consists of an automated deposition chamber, a photoresist dispense chamber for precise application of the photoresist material, and a photoresist develop chamber for post-deposition curing. The machine is capable of depositing photoresists ranging in thickness from 0.5 µm to 200 µm with a uniformity of ± 0.5 microns and a process rate of 11-30 wafers per hour. The tool can be used with standard photoresist chemicals such as SU-8, AZ, ORM, and HMDS, and can be optimized for specific photoresist applications including metal or dielectric coating, multilayer etch masking, and backside lithography. The temperature range in the deposition chamber is between 25-185°C, and a vacuum stable to 0.1 Torr can be achieved at lower process temperatures for critical etching processes. The asset offers a variety of features to enhance the performance of the photoresist application process, including an automated dispense flow calibration model for precise control, and a built-in data logger that records all process parameters. In addition, the equipment includes an internal diagnostics system to detect faulty operation during photoresist deposition. CRESSINGTON 108 Carbon/A photoresist unit is versatile and reliable, and is capable of producing high-precision, high-uniformity photoresist layers for a wide range of critical semiconductor applications. With its built-in automation, advanced diagnostics and monitoring capabilities, and control of process parameters, the machine is an ideal choice for industry-leading photolithography processes.