Used CSE S-470 #9409615 for sale

CSE S-470 is a positive photoresist system specifically designed for UV-exposure applications. It is composed of a polymeric component with a proprietary set of resins and photo-initiators which form the active component of the photoresist. In the presence of UV light, this component undergoes a photo-chemical reaction that results in the formation of a thin polymeric film. The thin polymeric film created by the photoresist system provides an undefined and uniform surface suitable for image-forming, as well as a barrier to protect the underlying substrate from contamination. As a result, it is able to produce extremely precise, high-resolution images for many types of applications. The photoresist is highly sensitive to UV light, which allows for a rapid exposure time and an increased resolution for the resulting image. Moreover, S-470 is extremely robust and resistant to abrasion, extreme temperatures, and harsh chemicals. This makes it an excellent choice for a variety of industrial applications such as electronics production, optical and medical device production, and circuit board lithography. CSE S-470 is also capable of accurately reproducing and transferring complex images, such as raised letters or intricate patterns. This is due to the fact that the substrate can be easily manipulated and shaped without significant change to the photoresist film or the exposed underlying substrate. Additionally, the photoresist can be easily and effectively stripped off of any substrate once it is no longer needed. Overall, S-470 is an excellent choice for many UV exposure applications. It is easy to use, robust, and resistant to a variety of environmental conditions. Moreover, its superior sensitivity and resolution make it ideal for complex images and lithographical applications.