Used CYBOR 05026-00CL B #86310 for sale

CYBOR 05026-00CL B
Manufacturer
CYBOR
Model
05026-00CL B
ID: 86310
Pump and accessories Pump controller model no.: 00505-05 Power supply model no.: 512-05 Cable sets for the above units.
CYBOR 05026-00CL B photoresist equipment is a state-of-the-art lithography system from Canon that is used for a number of applications including photomask, silicon wafer, MEMS, and other electronic device production. The unit is designed with a modular construction design, which makes it flexible and capable of a wide range of operations. The machine comes equipped with an adjustable 5 axis alignment and motorized stage, which enables precise placement of photoresist films and substrates. The motorized stage provides accurate and repeatable resolution of up to 0.1 μm, giving the tool an edge over manual positioning systems. CYBOR asset can accurately position substrates over a 9.3 cm by 9.3 cm area. This makes the model an ideal choice for advanced applications such as via production, advanced logic device production, nanodevice production and MEMS devices. The equipment is suitable for processing a diverse range of photoresists films, ranging from thin films to thick films. In addition, CYBOR system comes with advanced exposure parameters, allowing for the precise control of exposure dose and exposure time. This helps to ensure the precision and accuracy of the photoresist covered substrate. The unit also offers the ability to record data and analyze the results of each exposure. 05026-00CL B photoresist machine is designed for demanding high-tech applications. It is highly reliable, accurate and cost effective. The innovative motorized stage and high-speed exposure tool offer a precise and repeatable solution for a wide range of production needs. This asset offers maximum flexibility, allowing for the production of a diverse range of substrates, from thin films to thick films, through high-precision exposure parameters and advanced alignment options. CYBOR photoresist model provides the highest quality of photolithography for large-scale production needs.
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