Used DAN-TAKUMA TECHNOLOGIES SCH-2003BEW-S-D #9132943 for sale

DAN-TAKUMA TECHNOLOGIES SCH-2003BEW-S-D is a photoresist equipment designed to perform etching, patterning, and deposition processes. This system features a proprietary dual-beam unit that combines state of the art electronics and optics for superior processing stability and speed. The two beam machine enables simultaneous display, exposure and etching from both the front and rear of the workpiece. It features an advanced quartz viewing window that allows operators to monitor the etch and photo processes from different angles. This photoresist tool is equipped with a fully automated precision XY positioning and tracking asset which ensures accurate pattern placement regardless of the workpiece shape and size. It offers high speed patterning uniformity and repeatability for improved accuracy. It also offers UV and NIR exposure control capabilities. The model is integrated with a highly advanced photo-detector that accurately measures the amount of energy reaching the workpiece surface at any given time. This makes SCH-2003BEW-S-D especially suitable for processing challenging wafers with uneven resist layers. Additionally, the equipment also utilizes II-VI plating technology for improved corrosion resistance in etch process. Furthermore, the system's advanced exposure control software enables the operator to define the energy levels, pulse widths, and exposure times for repeatable results. With its high speed motors, the unit supports batch processing of complex components with the highest accuracy. DAN-TAKUMA TECHNOLOGIES SCH-2003BEW-S-D also features a unique post exposure bake capability to promote thorough post exposure hardening and solidification of the resist layer. This is particularly useful for processing temperature and time sensitive applications. An embedded photo-resistor aids in the precise calculation of the energy and photochemical properties of the exposed wafer surface. Overall, this photoresist machine from DAN-TAKUMA TECHNOLOGIES offers the flexibility and performance necessary for processing sophisticated components with dependable accuracy. It is also highly efficient and provides improved etch and patterning capabilities for faster development cycles.