Used DAN-TAKUMA TECHNOLOGIES SCQR-100CV #9132892 for sale

DAN-TAKUMA TECHNOLOGIES SCQR-100CV is a highly advanced photoresist equipment designed to precisely pattern glass, metal, ceramic, or other substrates. Its technological features and performance make it an ideal choice for demanding photolithography applications. SCQR-100CV offers a wide range of hardware features that enable it to meet the highest standards in the industry. It features three computer-controlled exposure heads, each equipped with eight intense ultraviolet lamps capable of operating at a range of up to 4ams/cm2. The exposure heads are coupled with automated xyz stages for precise alignment, and all components are incorporated into a compact platform that fits in a standard semiconductor processing environment. The system offers an array of operating parameters that allow users to precisely adjust the exposure power, intensity, and speed of the exposure process. DAN-TAKUMA TECHNOLOGIES SCQR-100CV is outfitted with proprietary software that enables users to easily program and operate the photoresist unit. The machine has an intuitive graphical user interface and a built-in image editing tool that allows users to customize their pattern designs in real time. Furthermore, the asset supports batch processing capabilities where users can program and control multiple exposure runs from a single application. SCQR-100CV also features a high-level of closed-loop patterning accuracy. It incorporates a number of powerful metrology systems that enable it to accurately measure and control the exposure process. It also provides users with numerous corrective tools to fine-tune the processes for maximum accuracy and repeatability. Overall, DAN-TAKUMA TECHNOLOGIES SCQR-100CV is one of the most advanced and finely tuned photoresist systems available in the market today. It offers a multitude of features and state-of-the-art technology that allows users to produce highly complex patterns with unprecedented precision. Its proprietary software, automated features, and closed-loop metrology systems enable it to consistently produce the highest quality patterns possible.